Used DAN-TAKUMA TECHNOLOGIES SCQR-3708BEW #9132918 for sale

DAN-TAKUMA TECHNOLOGIES SCQR-3708BEW is a state-of-the-art photoresist equipment used to pattern and etch thin films on substrate materials. The system is designed to provide precise patterning and etching, making it suitable for various photoresist processing applications, such as electronic device production, LED fabrication, and microchip production. SCQR-3708BEW supports standard ArF (immersion and dry) and KrF (dry) lasers with an exposure area of 280 x 220 mm. It has a modular design that allows for various configurations, allowing it to be adapted to the user's specific needs. Additional features include high-precision auto-alignment and throughput monitoring. DAN-TAKUMA TECHNOLOGIES SCQR-3708BEW also supports advanced scanning techniques such as 'skip fields', which allows complex patterns to be formed on the substrates. This helps reduce overall processing time and improves etch selectivity. Additionally, the unit features an integrated wafer chucking machine with low vacuum pressure for accurate alignment and improved feature fidelity. The tool's accuracy and operational speed are enhanced through its high-precision laser navigator, motor controlled stage, and light feed device. It also has a built-in dust cover and an improved vacuum asset to reduce contamination. In addition, the model is equipped with intelligent handling software, which allows for the automatic selection of optimal process parameters. SCQR-3708BEW is also equipped with a range of safety features, such as over-current protection, motion detection, and emergency stop buttons. The equipment is also designed to meet the industry's stringent safety standards. In conclusion, DAN-TAKUMA TECHNOLOGIES SCQR-3708BEW is a versatile and reliable photoresist system that is designed to provide accurate patterning and etching on substrates materials. It offers a range of advanced features, such as built-in dust cover, high-precision auto-alignment, and intelligent handling software, making it a great choice for various photoresist processing applications.