Used Dantakuma DT-1600 #9290797 for sale

Dantakuma DT-1600 is a photoresist equipment used mainly for precise patterning, particularly in the production of semiconductors and photomasks. It is a modular system composed of different components such as an exposure unit, a resist coating machine and a developing tool. The exposure asset uses a mercury vapor arc lamp to exposing photolayers to light. This model exposes the photoresist with a frequency of 1 to 10 Hz and a light intensity ratio of 0.2 to 0.3 MW/cm2. The exposure equipment has an adjustable focusing lens and a pattern generation software to define the exact shape of the pattern. The resist coating system is used to apply photoresist layers to the semiconductor wafers. This unit can apply a variety of photoresist films such as dry film photoresist, photoresist, SU-8 or photoresist. It includes two parts: a resist dissolution tank and a spin coater. The dissolution tank holds a solution of photoresist which is then transferred to the spin coater. The spin coater spins the wafer, which allows for the photoresist to be evenly distributed across its surface. The developing machine is used to remove exposed photoresist layers. This tool uses a mix of etchant chemicals and a developer solution to selectively dissolve the exposed photoresist layers from the wafer. The developer solutions may contain solvents, surfactants, alkalis, chelating agents, and salt buffers. DT-1600 is a powerful photoresist asset that allows for precise patterning on a variety of substrates. It can be used to create the intricate patterns necessary for semiconductor wafers, photomasks and other technologies. Its modular nature provides users with the flexibility to choose components that best fit their needs and budget.