Used DELTA 4CJ #293628703 for sale

DELTA 4CJ is a photoresist equipment developed by Hitachi Chemical Co., Ltd. to provide superior photo-sensitivity and high resolution for printed circuit board (PCB) and semiconductor device manufacture. The system consists of a solvent-developable negative-acting polymer matrix that is less affected by exposure to moisture and chemicals than competitor's photoresists. 4CJ unit offers superior stability due to its modified silicone-base polymers matrix, which is resistant to water and strong alkaline solutions that can cause early deterioration of other photoresists. This makes DELTA 4CJ machine particularly well-suited for high-temperature processes that require long solvent cycles. The modified polyimide contained in 4CJ also provides outstanding resolution, with fine line resolution of up to 0.5 micron achieved in light exposure. DELTA 4CJ's solvent-developable polymers require simple process conditions for optimal performance. A short spin cycle of 10-20 seconds in aqueous alkali developers ranging from 80-90º C is sufficient for dissolution. A post-bake at 240º C for 30 minutes accelerates development and improves yield. Exposure of 4CJ tool to high-energy UV light sources, such as the EL-20B Light Source available from the UV Curing Center, results in rapid dissolution and high contrast image development. DELTA 4CJ asset is highly resistant to post-exposure residue, which allows for improved adhesion of subsequent layers of conductive metallization or dielectric layers and increases the chance of successful fabrication in multi-layer assemblies. Additionally, due to its durable polymer matrix, 4CJ has excellent lifetimes after exposure, further ensuring superior performance over the long-term. In summary, DELTA 4CJ model is an excellent choice for high performance PCB and semiconductor fabrication processes due to its superior resolution and stability. The solvent-developable nature of the equipment also makes it easy to use, while its superior adhesion properties ensure success in complex multi-layer assemblies.