Used DNS / DAINIPPON 200W #293797341 for sale
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ID: 293797341
Wafer Size: 8"
Vintage: 1999
Coater / Developer system, 8"
Spin Coater (SC):
Rotation speed: 0-6000 RPM (CW,CCW)
PEEK Spin chuck
Resist nozzle scan speed: 25-85 mm/s
Pot rinse dispense flow: Maximum 30 mL/min
Edge cleaner nozzle
Back rinse dispense flow: 50 mL/min
Cup material: PP, PPS
SUS304 Exhaust material
Resist dummy dispense: Auto / Pre-dispense
Spin Coater (SC) / T-ARC:
Rotation speed: 0-6000 RPM (CW,CCW)
PEEK Spin chuck
T-ARC Nozzle scan speed: 25-85 mm/s
Pot rinse dispense flow: Maximum 30 mL/min
Edge cleaner nozzle
Back rinse dispense flow: 50 mL/min
Cup material: PP, PPS
SUS304 Exhaust material
Resist dummy dispense: Auto / Pre-dispense
Spin developer:
Rotation speed: 0-6000 RPM (CW,CCW)
PEEK Spin chuck
Nozzle scan speed: 25-100 mm/s
Nozzle cleaning dispense flow: Maximum 1 L/min
Pure water rinse dipense flow: Maximum 2 L/min
Back rinse dispense output: 4 Line
Cup material: PP,
SUS304 Exhaust material
Drain: Liquid-vapor separation
Resist dummy dispense: Auto / Pre-dispense
UV Wafer Edge Exposure unit (EE):
Vacuum sensor
Image sensor detector
Source: 200 W, HG - Xe lamp
Illumination limit control: Feedback auto-control
Indexer:
Built-in SMIF
ASYST INX 2200 Indexer
Wafer detector
Cassette defector
POD Detector
1999 vintage.
DNS / DAINIPPON 200W is a chemical micropatterning equipment developed by DNS Screen Manufacturing Co., Ltd. It is a photoresist system that enables the production of high-resolution and complex patterns. The unit includes a unique combination of precise cutting and stenciling capabilities, and offers superior device accuracy and ease of use. DNS 200W photoresist machine is based on two basic systems. The first tool is the photoresist asset, which enables the production of small high-resolution patterns on the substrate. This model uses a combination of reactive ion etching (RIE) and photolithography processes to deposit thin films of photoresists on the substrate. The thin films of photoresist are selectively exposed to UV light, which then triggers the photochemical reactions. This results in the deposition of a pattern of photoresist on the substrate, which can then be selectively transferred to a desired form. The second equipment is DAINIPPON 200W laser ablation system, which allows for the production of precise cuts and patterns on the surface of substrates. The unit works by directing a laser beam to the desired area on the substrate. When the laser beam contacts the substrate, it causes vaporization and evaporation of the materials, resulting in a precise cut or pattern. This process is highly accurate and repeatable, and can be used to produce complex arrays of features. Both systems are combined in 200W machine to produce micropatterned substrates. The photoresist tool is used to prepare a photoresist film on the substrate, which is then exposed to the laser beam to produce a conformed pattern. A highly accurate and repeatable pattern is achieved due to precise control of both the photoresist film and the laser beam. The combination of these processes results in the production of micropatterned device components that are highly accurate and easy to use. DNS / DAINIPPON 200W photoresist asset is widely used for applications such as thin film transistor arrays, integrated circuits, solar cells, and sensors. This model offers excellent device accuracy and repeatability, making it ideal for various applications. In addition, the equipment is also easy to operate and is highly cost-effective, making it an attractive option for many companies.
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