Used DNS / DAINIPPON 200W #9277847 for sale

DNS / DAINIPPON 200W is a high resolution, photoresist coating equipment designed for semiconductor device development. It is a flexible and efficient system suitable for processing both analytical and production applications. DNS 200W unit utilizes an advanced liquid-resist immersion lithography (LLI) technique, combined with automation to provide superior performance in a wide variety of wafer processing. The machine employs a multi-layer, multi-process photoresist coating, providing improved coating uniformity and thin-film coating characteristics. Additionally, a unique micro-fabrication technique is employed to ensure minimum line width variations due to local differences in resist coating thickness or surface roughness. The tool features automatic wafer loading design for convenient process repeatability. The asset is equipped with a color LCD monitor that displays time, temperature, pressure, and other important process data. Additionally, a user-friendly graphical interface with design-hint support makes pattern design easier and faster. The model provides an excellent resist adhesion without losing any resist properties, thereby offering higher line resolution and consistent resist profile than other photoresist systems. The equipment also provides a wide selection of photo resist coatings, ranging from positive and negative metals to acids and aqueous resist solutions. Furthermore, the system features a robot-controlled wafer-handling technology to enable high-accuracy and automatic silicon wafer mounting processes. Special consideration was taken when designing DAINIPPON 200W unit for the protection of clean environment. To ensure the quality of photolithography processing in the cleanroom, the machine is equipped with various filters and detectors to continuously monitor dust particles and humidity in the cleanroom. In sum, 200W tool provides an advanced, user-friendly photolithography processing asset with a wide range of coating materials for a wide variety of wafer processing. Its automated wafer handling and excellent resist adhesion enables high-resolution patterns to be developed in a clean environment, making it a great choice for semiconductor device development and production applications.