Used DNS / DAINIPPON 4-SC-80BW-AVE #293655891 for sale

DNS / DAINIPPON 4-SC-80BW-AVE Photoresist Equipment is a negative-tone photoresist technology. It is a system designed for use in semiconductor device fabrication processes, allowing for the patterning of layers on photoresist substrates. The name of the unit refers to the dimensions of the machine, which is four-by-eight centimeters and is manufactured by DNS. This photoresist tool is suitable for use in a wide range of semiconductor fabrication processes, including thick-film deposition, thin-film etching, lithography, dielectrics deposition, and other such operations. The asset features a monomer-grade molecular weight control agent and an anti-reflective coating, which allows for improved capabilities and subtractive photoresist imaging. This ensures that small features such as 0.1 micron lines can be produced on various substrates. The model is also designed to minimize reflection, which allows for uneven resistivity between layers and improved accuracy between patterning. The equipment requires the use of a thermal remedy film, as it is a negative resist. This film is applied to the substrate before the photoresist is imaged. The film protects the substrate from heat during the imaging process, prevents resist migration, and also has the added benefit of improved etching. Once the photoresist is imaged, the substrate can then be exposed to photonic or ionic processes. The thermal remedy film is also designed to ensure the resist can be removed without affecting the underlying circuit and its components. This is accomplished by the use of a beveling process, which leads to improved resist removal even on curved surfaces. Additionally, the system also features technologies such as deep-UV exposure, which are used to improve the accuracy and resolution of the patterned features. Ultimately, DNS 4-SC-80BW-AVE Photoresist Unit is an ideal solution for semiconductor fabrication processes, especially when patterning layers on photoresist substrates. The machine features a monomer-grade molecular weight control agent and anti-reflective coating, which helps to ensure small features such as 0.1 micron lines can be produced accurately. The tool also includes a thermal remedy film and deep-UV exposure control technologies, which protect the substrate and ensure improved resist removal.