Used DNS / DAINIPPON 60 #9271552 for sale

DNS / DAINIPPON 60
Manufacturer
DNS / DAINIPPON
Model
60
ID: 9271552
Coater system.
DNS / DAINIPPON 60 is a photoresist equipment that utilizes aqueous alkaline solutions and is designed to provide high sensitivity to ultraviolet light. This system functions by etching away thin layers of micro-thin film to create a photomask that allows for precise lithographic control. To begin, the desired pattern is aligned with a fused silica substrate. After this, a second fused silica layer with a planarizing layer is added over the substrate, which preps it for higher resolution imaging. The combined layers are then exposed to UV light which creates a photomask. The light is then quickly filtered out and the unexposed areas are etched away to create the desired pattern. Next, photoresist films are applied to the substrate. The films can be formed into uniform layers or be engineered for desired properties such as being chemically resistant. The photoresist films are then exposed to a UV-curable resin, and the remaining unexposed areas are etched away. The remaining UV-curable resin is then removed to create a final photomask that can be used for a variety of lithographic applications. This process produces photomasks with extremely fine resolution as compared to other photomasks, making it suitable for use in the semiconductor industry. The resolution the unit is able to achieve allows for the creation of complex shapes that are incredibly accurate. Additionally, its alkaline solution functionality allows for faster processing and lower activation energy than other photomasks. The machine also offers good environmental protection through its ability to produce photomasks that are both anti-radiation and anti-contamination. DNS 60 photoresist tool is a reliable, robust, and reliable asset that can be utilized for a variety of lithographic applications. Its versatility, precision, and alkaline solution capabilities make it a popular choice for many businesses looking for a cost-effective and efficient way to quickly produce photomasks for a wide range of purposes.
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