Used DNS / DAINIPPON 60A #293767676 for sale

DNS / DAINIPPON 60A is a highly advanced photoresist equipment developed by DNS Screen Co. Ltd. This system has been developed to provide a high productivity photoresist processing solution for the fabrication of device packages. The unit is composed of several parts, the main components being the exposure box, the transfer stage, and the resist developer. The exposure box contains the optical exposure head which irradiates the sample with light. The transfer stage is a precision stage which can accurately move the sample and exposure head in the horizontal or vertical direction. The resist developer is an inline processing unit which provides the developer liquid for photoresist processing. The machine utilizes a two-step process for photoresist processing. First, the optical exposure head is used to expose the photoresist sample to the desired light pattern. This light pattern is then transferred to the sample layer by the transfer stage. Then, the developer liquid is applied on the surface of the sample layer to create the etched pattern. This tool features a number of precision features that enable accurate photoresist processing. The asset is capable of setting the exposure head at accurate positions and angles, and this ensures the accuracy of the pattern transcribed onto the sample layer. Additionally, the model is equipped with a high precision actual-size projector which ensures the pattern size and shape accuracy required to obtain high precision electrodes. The equipment also features a wide range of settings to customize the photoresist processing. This includes parameters such as sensitivity, exposure time, exposure pattern, number of exposure plates and exposure speeds. In addition, the user can easily change the exposure unit to suit different sample sizes and substrates. In conclusion, DAINIPPON Screen Co. Ltd's DNS 60A photoresist system is a highly advanced photoresist processing solution. This unit offers a combination of precision, accuracy and customizability to enable high-quality photoresist processing.