Used DNS / DAINIPPON 60A #9162931 for sale

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Manufacturer
DNS / DAINIPPON
Model
60A
ID: 9162931
Wafer Size: 6"
Vintage: 1992
Developer system, 6" 1992 vintage.
DNS / DAINIPPON 60A is a chemical solution development equipment that utilizes photoresist technology to produce precision patterns on PCB boards and components. Photoresist technology allows for the formation of high-density, complex digital images on very small pockets of the pattern by controlling the patterning with light. This technology is used for a variety of applications in the electronics, automotive, telecommunications, and aerospace industries. The basic mechanism of photoresist technology involves covering the surface of the board or component with a chemical solution, referred to as photoresist, which reacts when it is exposed to ultraviolet (UV) or visible light. By selectively exposing the photoresist to light and shadow over the desired pattern, the photoresist hardens or is removed depending on the type of photoresist used. When the photoresist is removed from those areas that were exposed to light, the pattern of the photoresist will be permanently etched into the board or component. DNS 60A is suitable for applications requiring the highest resolution patterning and accuracy. It features an improved concentration of photoresist, resulting in a highly precise pattern of less than 1 micron. Additionally, the System operates with a highly developed delivery unit, producing a highly uniform coating of the photoresist solution on small surfaces. Further features include the ability to support multiple layers, accurate repeatability on consecutive layers, enhanced process control, and improved environmental control. Overall, DAINIPPON 60A is an advanced photoresist technology machine, designed for precision patterning on small surfaces. The Tool offers a greater resolution, precision, and accuracy than other photoresist systems, making it especially suitable for complex patterns used in aerospace, telecommunications, and other high-tech industries. By utilizing a highly uniform coating of photoresist solution and a multi-layer process, the Asset also allows for a speedy production process.
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