Used DNS / DAINIPPON 60A #9188819 for sale
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DNS / DAINIPPON 60A is an advanced photoresist equipment designed for the rapid application of thin and uniform coatings on wide and large substrates. This system is a state-of-the-art solution for the needs of microelectronic manufacturing, for example, in semiconductor wafer manufacturing. The unit is comprised of a series of components, including a high-power ultra-violet (UV) light source, which increases the speed of the deposition process and allows for control of film thickness. To ensure uniform deposition, the light source is equipped with scanners that move the beam in-plane and rotate it for optimal coverage. Further, the machine includes a number of optical filters, along with a quartz window that optimizes the transmission of the selected wave length range. In addition, the tool comprises of a temperature control feature that enables an even and reproducible coating on large substrates. The asset also facilitates hot/cold curing, which further improves the thickness uniformity and the stability of the photoresist film. In this mode, the process starts out with the application of hot vapours, followed by the cooling of the substrate to a set temperature. All of these features make this photoresist model ideal for large wafer production. Once the coating has been applied, it can then be exposed to a UV light source and developed with Developers such as DuPont 625F or OSRAM TO/T2. Usually, photoresists are visible and have an opacity. The photoresist DNS 60A, however, is engineered to be nearly invisible to the human eye, ensuring precise film deposition. In addition to the excellent resist properties that this equipment via the integrated filters enables, its design also offers considerable flexibility for use in a range of other processes. For example, its design supports a variety of custom-made solutions, varying from low to high temperature environments. The system is furthermore engineered to combine with an electron-beam for ultra high-resolution deposition. DAINIPPON 60A is a reliable and versatile advanced photoresist unit with features and applications tailored for wafer fabrication. The machine offers increased speed of deposition, improved uniformity of film deposition, and superior flexibility. It enables thin and uniform coatings and allows for precise deposition of delicate or complex features. Its high resolution combined with recurring results provide reliable operation and consistent quality. Make 60A the ideal solution for modern microelectronics manufacturing.
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