Used DNS / DAINIPPON 629 #9276179 for sale

DNS / DAINIPPON 629 photoresist equipment is a unique type of photolithography system designed for fabrication and electronic-based substrate processing. This unit is capable of producing high-resolution features with excellent process accuracy and repeatability. The machine is widely used in many industries, including the manufacturing of various electronic components. DNS 629 photoresist tool consists of several components. It has a reflection-type mask aligner equipped with two optical channels, allowing for exposures over wide areas. The asset also includes an automated mask handling model, capable of automatically exchanging masks and adjusting mask positions before exposure. An energy management equipment is also integrated within the system, allowing users to precisely manage exposure times. This photoresist unit is designed to support both positive and negative photoresists, providing users with the capability to achieve desired results. The machine includes a resolution of up to 0.25 µm and a stepper which enables users to expose up to 4 x 4-inch substrates with controllable and uniform exposure light intensity. The stepper also provides adjustable focus control, enabling the users to focus the substrate in the tool. DAINIPPON 629 asset includes a developer/stripper unit which enables developers to develop photoresist pattern into desired features and etch the substrate if required. Several other units, such as a photodiode unit and beam alignment, are also integrated into the model, making the equipment highly automated and efficient. Furthermore, this system is designed to be user-friendly with an intuitive programming interface which helps in easy programming of the unit and providing the user with digital monitoring and control of the machine parameters. It also has an advanced thermal control tool which provides advanced temperature control for accurate applications. Overall, 629 asset offers high performance, accuracy and repeatability, and a wide range of features. It is suitable for a variety of photoresist-based applications, making it an ideal choice for users interested in increasing product quality and minimizing production costs.