Used DNS / DAINIPPON 629 #9285138 for sale

DNS / DAINIPPON 629 is a positive-acting, high-resolution photoresist equipment developed by DNS Screen. This photo-active resist is based on a conventional novolac resin. This system is widely used in semiconductor processes, such as patterning high aspect ratio contact holes, trenches, and vias; creating gigabit density features for ULSI; and forming micro via holes for the fabrication of unit-in-package substrates. The machine is offered with two choices of polar solvents such as propylene glycol monomethyl ether acetate (PGMEA) and propylene glycol monomethyl ether (PGME). The tool also provides a wide range of radiation exposures, including Deep UV (DUV), ArF Laser, i-line, G-line, and i-line masking with high resolution capability and uniform shrinkage. It has a high sensitivity that allows easy exposure, produces uniform line and space (L/S) structures, and exhibits excellent film-properties such as adhesion and line edge roughness (LER). This resist asset also features minimal resist aggressive under-cutting during CMP process, making it ideal for multi-level contact hole, trench and via processes. The resist model's improved alkali developers enable a more effective etch process. DNS 629 photoresist film has good wet etching resistance to achieve high aspect ratio contact holes (HAR). The resist film can also be developed to obtain cleaner sidewall profiles with a small angle AC amplitude profile, i.e., low underlying oxide level. The equipment also offers excellent thermal stability, making it suitable for high temperature process such as metal sputtering, reflow and soldering. Additionally, DAINIPPON 629 system possesses good solubility in organic solvents, allowing easy applicability and good adhesion with a low distance of a bump top or multi-level surface to the substrate surface. Finally, 629 photoresist unit has excellent reproducibility and is considered to be environmentally safe, meeting the SMIC, UMC and IMEC safety standards. In general, this resist machine offers an excellent photolithography performance for advanced packaging and semiconductor process applications.