Used DNS / DAINIPPON 80 A / 80 B #9161502 for sale

DNS / DAINIPPON 80 A / 80 B is a photoresist equipment developed by DNS Screen Manufacturing Co. Ltd. and is used as a photoresist material for lithography, primarily for the manufacture of silicon semiconductor devices. The system is made up of a photoresist film and a developer solution, and is designed to provide a high resolution, low cost, and process integrity for improved lithographic performance. The photoresist film consists of a polymeric material in the form of a suspension in an organic solvent, typically methanol. It contains an anionic photosensitizer, a photoactive compound, and a thermally modifiable acid catalyst. When exposed to light, the photosensitized molecules rearrange their form to form an acid catalytic molecule, which in turn catalyzes the release of a polymerizing radical that causes the polymeric material to harden and form a resist structure. The developer solution is a dilute aqueous ammonia-based solution containing a base catalyst and an aqueous thiol-type polymeric material. This solution acts as a deacidifying agent, which neutralizes and dissolves the resist structure formed when the photoresist film is exposed to light. This allows for a more precise control of the exposed photoresist layer. The combination of these components provides the unit with some unique advantages for lithographic processes. First, the polymeric material used in the photoresist film provides high resolution imaging, enabling the use of the machine for a wide range of wafer sizes and applications. Second, the developer solution is highly stable and tends to provide long term process integrity, with minimal sensitivity to degradation from contamination or age. Finally, the tool is relatively low cost, making it an attractive option for low-cost lithography processes. Overall, DNS 80 A / 80 B photoresist asset provides a high resolution, low cost, and process integrity-oriented lithographic material for a wide range of semiconductor manufacturing applications. Through its excellent imaging and stability characteristics, the model is highly suitable for a variety of processes, from large scale integrated chips to small scale integrated circuits, and from memory chips to logic node design.