Used DNS / DAINIPPON 80A #293658186 for sale

DNS / DAINIPPON 80A
Manufacturer
DNS / DAINIPPON
Model
80A
ID: 293658186
Wafer Size: 8"
Wafer scrubber, 8".
DNS / DAINIPPON 80A is a negative photoresist equipment, commonly used in semiconductor fabrication. It is suitable for microlithography, plating, and printing applications. Photoresist systems play a key role in the production of microelectronic devices and printed wiring boards. Photoresist systems use light radiation to create patterns on a substrate. In the case of DNS 80A, the light source is usually a xenon lamp. As the light beam passes through the photomask and hits the substrate, a pattern is created. Depending on the type of photoresist, some molecules are destroyed and some are preserved. DAINIPPON 80A system consists of a layer of photoresist on a substrate. The resist layer is then exposed to a light beam which has been filtered through a photomask. The photomask contains a pattern of opaque and clear areas. When the light passes through the photomask, it selectively decomposes the resist molecules, leaving behind a pattern of exposed and unexposed areas on the substrate. Once the resist layer has been exposed, it is developed. During this process, the unexposed resist is removed with a solvent, leaving behind a pattern in the resist. This pattern can then be used as a template for a further process, such as etching or deposition, or it can be used to create a self-aligned routing via. Additionally, a further imaging step may be performed if more structures need to be created. 80A resist unit offers excellent resolution and high selectivity. Additionally, it is very stable and can be used in harsh process conditions, such as anisotropic etching. Furthermore, it has a low absorption of electromagnetic energy, which allows for its use in high speed device processing. In conclusion, DNS / DAINIPPON 80A photoresist machine is a reliable and efficient tool. It provides excellent resolution and reproducibility, as well as a very high selectivity, which is essential for the productivity of modern-day semiconductor fabrication.
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