Used DNS / DAINIPPON 80A #9133638 for sale
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ID: 9133638
Scrubber
Top side spin
(1) Brush scrub
Brush material: Mohair brush or PVA brush
Brush contact distance: +1mm to -5mm max from wafer surface (adjustable at unit of 0.01mm)
Brush revolutions: 440 rpm/60Hz, 380 rpm/50Hz (allowance of revolutions: ±10% max), non-rotation also settable
Brush cleaning function: DI water washing at the brush standby zone by straight nozzle
(1) Nano spray nozzle scrub
Nozzle scanning scrub by high pressure DI water/N2
Nano nozzle angle: Approx 90 deg. to wafer surface
(1) Nano nozzle
Filter PALL DFA-4201 NIEY 0.1um
(1) DI water rinse
Filter PALL DFA-4201 NIEY 0.1um
Flow meter: Max. 1000 ml/min
(1) Back rinse
Filter PALL DFA-4201 NIEY 0.1um
Flow meter: Max. 200 ml /min
(1) Brush cleaning
Filter PALL DFA-4201 NIEY 0.1um
Flow meter: Max. 1000 ml /min
Back Side Spin Scrubber Specification:
(1) Brush scrub
Brush: 0.1mm Nylon or PVA brush
Brush contact distance: +1mm to -5mm max from wafer surface(adjustable at unit of 0.01mm)
Brush revolutions: 440 rpm/60Hz, 380 rpm/50Hz (allowance of revolutions: ±10% max), non-rotation also settable
Brush cleaning function: DI water washing at the brush standby zone by straight nozzle
(1) D-sonic nozzle
Nozzle scanning scrub by D-sonic DI water
Nozzle material: PP,PFA,PVDF
Nozzle angle: Approx 90 deg. to wafer surface
(1) D-sonic DI water nozzle
Filter PALL DFA-4201 NIEY 0.1um
(1) DI water rinse
Filter PALL DFA-4201 NIEY 0.1um
Flow meter: Max. 1000 ml/min
(1) Back rinse
Filter PALL DFA-4201 NIEY 0.1um
Flow meter: Max. 500 ml /min
(1) Brush cleaning
Filter PALL DFA-4201 NIEY 0.1um
Flow meter: Max. 1000 ml /min
Spin motor specifications (Top Side Unit):
Motor: brushless servo motor
Revolution: 0 rpm to 4000rpm
(subject to load of 150mm silicon wafer)
Max. acceleration: 50000 rpm/s
(subject to load of 150mm silicon wafer)
Accuracy: ±1.5 rpm
Max. revolutions: 9990 rpm(motor individual)
Spin Motor Specification:(Back Side Unit)
Motor: brushless servo motor
Chuck pin : PEEK
Revolution: 0 rpm to 6000 rpm
(subject to load of 150mm silicon wafer)
Max. acceleration: 1000 rpm/s
(subject to load of 150mm silicon wafer)
Accuracy: ±1.5 rpm
Max. revolutions: 9990 rpm(motor individual)
Chuck positioning mechanism: driven by spin motor
D-Sonic nozzle specifications:
Ultrasonic output: Max 48 W (1.5 MHz)
Output current: 0.3 to 0.9A
DI water flow rate: 0.6 to 1.0 L/min (variable by needle)
Other specifications:
(1) DI water
(1) N2
(1) Vacuum
(1) Dry Air
(2) Spin exhausts.
DNS / DAINIPPON 80A is a photoresist equipment used in the chip making process for various integrated circuit components. It is a single, self-contained platform that provides the liquid crystalline resist chemistry, exposure optics, and post exposure treatment steps that are critical for the process of producing high-performance, high-yield semiconductor integrated circuits. The system comprises a mercury arc lamp, providing a high neon-argon line output, for single or vertical twin exposure. The vacuum optics assembly contains a vacuum integrator, an adjustable-focus condenser lens with a variable spacing spacer, polarized glass and a iris diaphragm. The optics assembly also contains a "spark" indication indicator which can be used to observe the arc discharge through the frosted condenser lens. The resist chemistry uses an aqueous base solution and features a bake-without-softbake capability. This allows for the elimination of an intervening develop step, thereby increasing throughput. The resist chemistry also features active corrections for the effects of temperature, humidity, and light exposure. The unit also contains a post-exposure treatment or PET module which is designed to optimize the performance of the machine. This module contains an infra-red energy source and a plasma filter. The plasma filter reduces the defectivity of the exposed resist layers while the IR energy source accelerates the curing process, which helps reduce development time. The tool can be further customized for specific application requirements using additional PET components. DNS 80A photoresist asset is a fully automated model designed for use in a lithography equipment for the production of high performance and high yield semiconductor integrated circuits. It has been designed with the latest in optics and resist chemistry technology to optimize throughput and yield, while providing the flexibility that is essential for a successful process.
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