Used DNS / DAINIPPON 80A #9162939 for sale

DNS / DAINIPPON 80A is a high-quality photoresist equipment designed for the production of electronic components in semiconductor substrates. The resist system is based on the conventional negative-type photoresist process, involving a chemically-amplified novolak resin as the base layer. With a sensitivity of 850 mJ/cm2, it provides excellent image delineation and a high degree of reproducibility. It is suited for a variety of processes from sub-micron to ultra large-scale integrated circuits fabrication. The process begins with the spin-coating of the resin on the substrate, followed by the pre-bake and post-exposure bake. The pre-bake allows the residual water to evaporate from the resist film, before the resist layer is exposed to the photo-mask. During the post-exposure bake, the resist film bakes at a temperature higher than the pre-bake temperature, hardening and densifying the resist film. The post-exposure bake ensures good image fidelity as the cured polymer layer has less than 0.5% out-of-plane deviation. The minimum features size obtainable is 0.6 µm, which is suitable for the production of transistors, capacitors and other miniaturized electronic components. Moreover, the photoresist contains A-TSQ, which helps reduce the effects of alkali penetration. The developed film is then developed in a solution of sodium carbonate and ammonium hydroxide. The resulting resist pattern is then transferred to the substrate by a dry-etching process. This process combines high image fidelity and low dry-etch bias to achieve excellent selectivity when etching different materials. In addition to its general purpose capabilities, DNS 80A is suitable for ion implantation and advanced patterning structures. With its low k-factor and good depth of focus, the resist unit performs well in advanced patterning processes. It enables high-performance performance and low yield loss, making it an ideal choice for a wide range of semiconductor production processes. The machine is also very reliable, allowing for the production of high-quality, reliable microelectronic components. It has been used in production processes for the past ten years, and its performance has been consistent throughout this time. Its ability to produce repeatable and reliable semiconductor components on small and large wafers makes it ideal for a variety of applications.