Used DNS / DAINIPPON 80B #9243276 for sale

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Manufacturer
DNS / DAINIPPON
Model
80B
ID: 9243276
(2) Coater / (3) Developer system (4) Load ports IDI Pumps.
DNS / DAINIPPON 80B is a revolutionary photoresist system specifically designed to provide superior performance in the production of wafer-scale devices. It is an enhanced chemical-mechanical process that combines a chemical wash, a nanoscale low-temperature annealing procedure, and an imprint lithography method to impart excellent resolution and adhesion properties to dielectric layers in the production of micro- and nano-structures. The chemical process entails the removal of native oxides from the wafer surface in order to create a clean and adherent layer, ensuring an ideal bond between the photoresist and the device layer. The nanoscale low-temperature annealing process increases the stability and uniformity of the device layer by locking in the desired characteristics. In combination with an imprint lithography technique, DNS 80B system helps to produce wafer scale devices, featuring extremely fine resolutions down to 55nm. This technique combines a ultra-sensitive photoresist layer with a highly advanced design template. The photoresist is applied via an advanced spin-coating process and is exposed to brief pulses of light to precisely determine the pattern and corresponding structures that will be produced. Due to the low activation temperature, the exposed areas are cooled down immediately after the exposure. This allows for better pattern control, registration accuracy and edge quality, while also benefiting from low electrical leakage. In addition, a well controlled etching process enables devices to be formed with tight line widths and highly uniform features. Finally, the photoresist is stripped away in a chemical solvent, allowing the device layer to be applied. In summary, DAINIPPON 80B Photoresist system has proven to be a robust and reliable process, producing wafer scale devices with improved performance. Its enhanced chemical-mechanical process, combined with advanced lithography method, ensures extremely fine resolution and superb adhesion properties. This ensures high performance devices with superior uniformity and tight line widths.
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