Used DNS / DAINIPPON 80B #9250084 for sale

DNS / DAINIPPON 80B is a water-based photoresist equipment designed for wide-format lithography applications. The system utilizes a high-resolution photoresist emulsion, which is light-sensitive to a broad range of wavelengths. The photoresist is formulated to produce very fine patterns when exposed to ultraviolet light. The unit consists of a developer, binder, and four component photoresist solution. The developer is a base solution used to rinse off any excess photoresist exposing the surface for the exposing process, or to add additional protection without affecting the exposure process. The binder binds the photoresist to the surface and provides a durable image for etching and other processes. The photoresist solution is an optically active emulsion with photocatalyst, sensitizer, and stabilizers. The photocatalyst improves light sensitivity and increases solid content, while the sensitizer amplifies the sensitivity of the photocatalyst. The stabilizers extend shelf life and improve the quality of the resist. The machine has a relatively wide exposure window, allowing for an exposure time of up to 1.5 minutes per square foot. This allows for a high speed and quality of lithographic imaging, which is necessary for extensive printing applications. Additionally, the dynamic sensitivity of the tool allows for accurate representation of a wide range of colors. The imaging process relies on the unique properties of each solution and emulsion to provide consistent results. By using the developer and binder together, the layer of photoresist is made more stable and uniform. This prevents faint images from developing, which could cause undesired patterns. Furthermore, the chemical reaction between the sensitizer and photocatalyst results in an accurate representation of the desired pattern. The alkaline characteristics of the asset also help to reduce the time and temperature needed for the drying process. The speed and temperature of the drying process is critical for avoiding streaks or distortions in the material. Additionally, the non-toxic water-based solution eliminates the need for a number of hazardous chemicals and provides a much safer working environment. Overall, DNS 80B model is a reliable and safe choice for lithographic applications. Its wide exposure window and dynamic sensitivity offer a high quality image representation, while its water-based emulsion provides a fast and efficient printing process.