Used DNS / DAINIPPON 80B #9257028 for sale

DNS / DAINIPPON 80B is a photoresist equipment specifically designed for use in the printed/semiconductor industry. This system is a solvent-based unit and an advanced material development in lithography that can be used for both negative and positive photoresists. The photoresist of DNS 80B is made up of two components, a polystyrene resin and a monomer. The polystyrene resin originates from a 100% styrene monomer, while the monomer is made up of modified styrene with a halogen-containing material. With these two components, the material's mechanical and chemical properties can be customized to meet specific application requirements. The components of the photoresist combination perform two important tasks when exposed to light. First, the polystyrene resin absorbs the energy from the exposure (light) and builds up the cross-linking of the chains. This causes a hardening of the photoresist and creates the required pattern that is printed on the substrate. The monomer in the photoresist is responsible for a different property. When exposed to UV light, it undergoes a polymerization reaction, creating a complex polymer network which is highly resistant to destructive acids, alkalis, and other solvents. This ensures that the photoresist is stable when exposed to the basic etching and cleaning processes used in the semiconductor manufacturing process. DAINIPPON 80B machine is not only unique because of its two-component polymer structure but also because of its film forming capability. It is highly conformable with any type of substrate, such as copper, tungsten, and palladium. The tool can be formed into flexible, resilient film layers with excellent adhesion to the substrate. Additionally, this asset is highly resistant to common photoresist liquids and solvents. Furthermore, 80B is also an environmentally-friendly photoresist. It was designed to meet the stringent environmental safety requirements posed by the Japanese Ministry of the Environment, with VOC emissions under 30ppm. This model meets all laboratory requirements and is approved by the European Union for some processes. Overall, DNS / DAINIPPON 80B photoresist equipment is an advanced material development in lithography, providing superior optical performance, excellent film adhesion and optical properties, and environmental friendly features. This system provides excellent photoresist properties for demanding semiconductor applications and can produce a wide range of images on a variety of substrates.