Used DNS / DAINIPPON 80BW #9134993 for sale

DNS / DAINIPPON 80BW is a photoresist equipment designed for use in a variety of integrated circuit (IC) manufacturing processes, including wafer fabrication. The system is based on a chemical composition of polymethylmethacrylate (PMMA) dissolved in a mixture of anisole, cresol, and other chemicals. When exposed to ultraviolet (UV) radiation, DNS 80BW undergoes a photopolymerization reaction, creating a highly resistive polymeric layer on the wafer surface. This layer serves as a protective coating, providing protection against unwanted contamination, such as metal or organic residue, during further IC fabrication processes. The main benefits of using DAINIPPON 80BW as a photoresist unit include a high resolution at low energy doses, a wide range of exposure times and sensitivities, and a high overall resolution. Additionally, 80BW is formulated to dry quickly, reducing the risks of contamination and degradation during IC fabrication. The wafers used in DNS / DAINIPPON 80BW must be clean and free from contaminants prior to exposure. The wafer is first place in the radiation source, where it is illuminated with UV radiation. Depending on the desired result, the wafer may need to be exposed multiple times. During the exposure process, the photoactive ingredients in DNS 80BW undergo a chemical change, forming a resistive layer on the surface of the wafer. This layer may then be further processed using etching or similar techniques. Throughout its use, DAINIPPON 80BW has been tested for its effectiveness across a variety of IC fabrication steps. In general, ICs produced using the machine exhibit high resolution, good surface levels, and lower etch rates. Additionally, it is noted for its relatively short exposure times and excellent resolution. As a result, 80BW is a widely used photoresist tool for a range of IC designs and uses.