Used DNS / DAINIPPON RF3 #9213798 for sale

DNS / DAINIPPON RF3 is a precision photoresist equipment based around the use of nitrocellulose, chromium, and a highly sensitive photosensitizing material. This material, referred to as DNS RF3, is a proprietary resin blend developed by DNS in Japan. Once exposed to light, DAINIPPON RF3 develops a hardened layer on the substrate which can then be used to control resolution, line widths, and aspect ratios on nanoscale devices. RF3 system provides a cost effective and precise way to create nano-scale photolithography patterns on complex structures. The unit consists of a combination of DNS / DAINIPPON RF3 resin, chromium, and a photosensitizing material that is deposited on a substrate. The photosensitizing material absorbs the light energy from the exposure beam and the resulting reaction with DNS RF3 results in a layer of hardened material. This hardened layer can be etched in particular pattern to give the design that is required. The machine also requires the use of a micro contact printer and precision mask aligner. The contact printer is used to prepare the substrate for the photoresist by laying down the chromium and DAINIPPON RF3 material in the correct arrangement and in the correct areas. The mask aligner is then used to position a photomask containing the desired pattern to be exposed to the light beam. After the substrate is exposed, the photoresist is developed, which is the process of removing areas of hardened material to create a pattern. The advantage of RF3 tool is that it provides precision lithography at a fraction of the cost compared to traditional optical lithography systems. While not limited to the production of nano-scale devices, it is in this field that this asset has been proven to offer excellent results. The model is also relatively simple to operate and can be used in a wide range of applications including micromechanical systems, printed electronics, displays, and imaging optics. In conclusion, DNS / DAINIPPON RF3 equipment provides a cost effective and precise way to create nano-scale photolithography patterns on complex structures. The process is relatively simple, and the advantages of the system are that it can be used with precision for a wide range of applications.