Used DNS / DAINIPPON RF3 #9360860 for sale

DNS / DAINIPPON RF3
Manufacturer
DNS / DAINIPPON
Model
RF3
ID: 9360860
Coater / Developer system 193 nm.
DNS / DAINIPPON RF3 is a state-of-the-art photoresist equipment, developed and manufactured by DNS Inc., a leader in the field of photomask technology. The system has been engineered to deliver the best results in resolution, line width, and contrast, while at the same time providing superior performance in high productivity and low environmental impact. This photoresist unit is composed of four main components, namely: 1. Photoresist Coater: The Photoresist Coater is the first step in the machine and is used to evenly coat the photomask substrate with photoresist. The coater features a variable disk speed, vacuum chuck, and optional quick change feature that allow the user to quickly and easily switch between different photoresist formulations. 2. Exposure Module: The Exposure Module is the second step of the tool and is used to expose the photomask substrate with light. It features a high-energy laser, which is capable of exposing a single section of the photomask at a time and features a variable beam size and auto-focusing capabilities for enhanced resolution. 3. Post-Exposure Bake/Burn-off Module: This module is the third step of the asset and features a permeable lamp for the post-exposure bake. This module can also be used to burn-off the photoresist, if desired. 4. Developing Module: The Developing Module is the final step in the model and is used to remove the exposed photoresist from the photomask substrate. It features a flow-through design, which allows for consistent and even development throughout the photomask substrate. Overall, DNS RF3 photoresist equipment has been engineered to provide superior accuracy, resolution, and contrast, while also delivering enhanced performance on a high production scale. It is an effective and cost-efficient solution for those looking to produce lithographic photomasks with ease and precision.
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