Used DNS / DAINIPPON RF3 #9360865 for sale

DNS / DAINIPPON RF3
Manufacturer
DNS / DAINIPPON
Model
RF3
ID: 9360865
System.
DNS / DAINIPPON RF3 is a high-performance, halogen-free, analog-capable positive photoresist equipment created by DNS Screen Mfg. Co., Ltd. The system offers excellent resolution definition, fast process speed, and a wide process window. The main components of the unit are: a photosensitive film; a developers and solvents; development solution; an etchant; and an oven. The photosensitive film contains three layers: a photopolymer layer; a light-scribe layer, which when exposed to light forms patterned geometric microstructures or lattices; and a photomask layer, which blocks certain wavelengths of light. The development solution is a water-soluble mixture that contains chemical compounds designed to facilitate the development of the photosensitive film. The etchant helps to dissolve the chemical compounds in the developer. To further aid in the development process, an oven is used to bake the photographsensitive film, enabling it to become crosslinked and durable. The photosensitive film is exposed to light over varying time intervals. This process is called "radiographic exposure" and is used to create specific patterns. During this step, the light-scribe layer is exposed to specific radiation, forming the pre-defined patterns in the photomask layer. Once the photosensitive film has been exposed to radiation, it is developed using the etchant and developer. During the development process, the etchant helps to dissolve the chemical compounds in the developer, creating microstructures and lattices in the photomask layer. Once the development process has been completed, the photomask layer is then lifted off of the photosensitive film. Finally, DNS RF3 photoresist machine is designed for short-term, analog-capable imaging applications. This enables users to create multiple image layers without the need to re-expose a single image multiple times. It also allows users to have precise control over the resolution of the image. The photoresist tool is ideal for creating intricate patterns and small components. Additionally, the asset provides fast process speed, excellent resolution definition, and a wide process window.
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