Used DNS / DAINIPPON RF3S #9389840 for sale

DNS / DAINIPPON RF3S is an advanced photoresist equipment designed to provide superior film thickness control and patterning resolution for large-area manufacturing applications. This system is specifically designed to meet the sophisticated requirements of applications such as semiconductor wafer manufacturing, LED displays, and device packaging. DNS RF3S utilizes a proprietary high-precision nozzle unit, in combination with an advanced surface treatment, to uniformly spread photoresist on the sample surface with high repeatability and homogeneity. This allows for extremely thin film coatings with nanometer-level uniformity of 7nm or less. The machine is also capable of supplying photoresist in very precise amounts, at concentrations up to 6 parts per million. DAINIPPON RF3S utilizes a patented "wide-angle nozzle" to ensure a well-distributed photoresist vapour stream. This enables a uniform coating on a flat surface and minimizes uneven coating or bridging between closely-spaced patterns. The quality of the photoresist deposited is also maintained through a unique "Non-Volatility Control Tool", which prevents degradation of the photoresist film, while also preventing accumulation or waste of the photoresist. RF3S also utilizes a unique film thickness control asset, which automatically adjusts the rate of deposition and flow in order to achieve a uniform film with a precisely controlled thickness. This model utilizes a closed loop feedback control to ensure precise concentration and thickness of the photoresist deposit and provides a mechanism for reducing parasitic absorption in the underground substrate. Given the need for advanced photolithography film deposition systems for advanced packaging and wafer-level processes, DNS / DAINIPPON RF3S provides an excellent solution for large-area manufacturing applications. Its advanced features are critical for achieving the desired patterning resolution and uniformity. Combine with an automated back-end processing equipment, such as Nanotech's BRUCE system, DNS RF3S unit is capable of delivering some of the most advanced photoresist technology available.