Used DNS / DAINIPPON SC-200W-AV #9083741 for sale

DNS / DAINIPPON SC-200W-AV
ID: 9083741
Wafer Size: 8"
Vintage: 2003
System, 8", 2003 vintage.
DNS / DAINIPPON SC-200W-AV photoresist equipment is an advanced dry film processing and soft baking system for the fabrication of circuit boards. The unit features an integrated scanning alignment machine, quick-bake chamber for rapid soft bake, automated developer, and a uniformity detection tool. DNS SC-200W-AV uses a rotary stepper to deliver photoresist film onto a substrate and aligns the mesh on the film to the substrates. It also features an advanced scanning alignment asset to perfectly align the circuit boards from the substrate for processing. This improved alignment technology results in perfect product registration and accuracy and higher yield than its competition enabling a higher throughput. The quick-bake chamber utilizes a three pass heating model that evenly heats up and enables a programmed soft bake of the substrate taking only a few minutes to do so. The oven temperature and adjusting the timer can also be easily changed depending on the conditions of the surrounding environment. The swift baking process results in fewer defects, fewer layer distortion, and more efficient substrate handling. The integrated developer module allows for accurate and even photoresist development using a fast developing process with a consistent resist pattern. The equipment also features a uniformity detection system to identify incorrect resist patterns and unsuitably developed resist patterns. This ensures high quality circuit boards are provided and produced. DAINIPPON SC-200W-AV photoresist unit provides an efficient and reliable machine for circuit board fabrication. Featuring an integrated scanning alignment tool, quick-bake chamber for rapid soft bake, automated developer, and a uniformity detection asset, the model produces high quality boards with fewer defects and more accurate layers. The uniformity detection equipment also ensures only the best circuit board patterns and resists are produced.
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