Used DNS / DAINIPPON SC-200W-AV #9210334 for sale

DNS / DAINIPPON SC-200W-AV is a photoresist exposure equipment designed for production environments. It is equipped with a high-resolution optical imaging design and advanced control software. The system is designed to provide precise and repeatable results during the photolithography process. DNS SC-200W-AV uses a high-resolution projection lens assembly to provide superior imaging accuracy in the exposure process. The lens consists of eight interchangeable elements, including achromatic doublets and planar field lenses. This ensures excellent imaging stability and repeatability. The unit also includes a mechanical autofocus calibration machine for reliable performance. The imaging software included in the tool includes a unique algorithm which allows for accurate exposure control. It includes features such as mosaic image stitching, which allows users to capture multiple images of the same object. This ensures continuous coverage across the entire target area. The asset also includes an advanced programmable mechanical shutter, which allows for precise exposure timing. DAINIPPON SC-200W-AV provides advanced substrate protection during the exposure process. The model includes an automated ambient light control equipment which keeps the photoresist from being overexposed. Additionally, the system also includes a nozzle deposition unit, which accurately applies the photoresist to the wafer. The machine also features a multi-head auto-focus tool for ensuring accuracy. In order to ensure consistent, repeatable results, SC-200W-AV offers advanced inspection and calibration capabilities. It includes an automated quality control asset, which monitors exposed layers for errors. Additionally, the model includes an automated reticle alignment equipment for accurate tracking and piecing of the layout. Overall, DNS / DAINIPPON SC-200W-AV is an advanced photoresist exposure system which provides accurate and repeatable results. Its advanced optics and software allow it to accurately image and expose photoresist onto wafers with great precision. The unit's advanced protection and inspection capabilities make it suitable for use in production environments, ensuring consistent and reliable results.