Used DNS / DAINIPPON SC-60BW-AV #9235498 for sale

DNS / DAINIPPON SC-60BW-AV photoresist equipment is an efficient system for etching tiny features on thin substrates, such as ICs, optoelectronics, and microelectromechanical (MEMs) devices. The unit uses a dual-resist process in which a resist material is chemically exposed to different wavelengths of light. This process improves adhesion between the substrate and the photoresist, resulting in improved etch features. DNS SC-60BW-AV machine works by exposing the photoresist to a beam of UV laser light. This causes a chemical reaction which selectively etches the surface of the substrate. The wavelength of the laser is adjustable in order to achieve different etch depths. The tool is capable of creating very small features, such as lines or dots, down to a few microns in width. In order to ensure precision etching, the asset's resistance material must be properly tuned to the desired wavelength. A combination of optical feedback and precision beam control allows the model to generate a precisely tuned resist pattern with high accuracy. The equipment also features an automatic calibration process which rapidly adjusts the etch profiles according to the material being used. The system also incorporatges an image display unit which displays etching results in real time. This allows engineers to quickly assess the quality of the etch features, and make necessary adjustments in order to obtain a desired outcome. To ensure maximum efficiency, DAINIPPON SC-60BW-AV photoresist unit is equipped with an advanced cooling machine which helps reduce heat generated during the etching process. This helps to ensure precision etching while preventing damage to the substrate. Overall, SC-60BW-AV photoresist tool is an effective tool for etching fine features on thin substrates. By using a dual-resist process and automated calibration, engineers can quickly create accurate etch patterns with ease. The asset is reliable, efficient, and aesthetically pleasing, making it an excellent choice for thin substrate etch processes.