Used DNS / DAINIPPON SC-80A-AVFG #9148240 for sale

DNS Screen DNS / DAINIPPON SC-80A-AVFG photoresist equipment is an advanced semiconductor device lithography system designed for high resolution fabrication of semiconductor devices. Its core feature is its multi-channel exposure technique, allowing for high uniformity and coating repeatability in difficult to replicate structures such as finFET and memory arrays. DNS SC-80A-AVFG unit uses a versatile range of lenses focused upon the substrate, including variable focus zoom, f-theta, and aspheric lenses which can produce a wide range of pattern geometries for challenging device geometries. Additionally, a unique mask transmission measurement machine helps ensure accurate placement of exposed patterns. DAINIPPON SC-80A-AVFG tool also includes a 1.3x high resolution photomask scanner, which allows for mask-to-mask alignment accuracy up to one arc-second, taking into account possible image deformation due to mask defects. This allows for accurate pattern transfer between masks, allowing for efficient use of masks in successive lithography steps. Furthermore, its multi-channel exposure capability allows for precise control over resolution of un-etched patterns, with a high level of repeatability of patterns. Its innovative print optimization algorithm makes sure to maximize throughput on the reticle while ensuring a predefined optimum uniformity between Patterns of identical size, a major limitation of conventional lithography systems. SC-80A-AVFG can also expose challenging patterns in order to create unique and complex 3D-structures, with a minimum feature size of 40nm and maximum feature size of 1000um accomplished in one exposure. Its multi-wavelength, high-stability illumination asset ensures the accuracy and repeatability of the model's exposure patterns, and its spectral filtering function allows for UV wavelengths from 203 nm up to 300nm. Finally, its specialized software suite combines diagnostics and process control in order to accurately inspect and analyze observation data. It features a fully automated operation as well as an interactive mode for reviewing results in real time. This helps the development of state-of-the-art products to be optimized in an effective fashion, and makes this equipment an ideal solution for the challenging lithography process of the modern semiconductor device.