Used DNS / DAINIPPON SC-80BW-AV #9235507 for sale

DNS / DAINIPPON SC-80BW-AV Photoresist Equipment is a fully automated, highspeed wafer processing system. The unit consists of four main components: a wafer transport, a spin-coat unit, an exposure unit, and a development unit. The wafer transport moves the substrate from the wafer loader to the spin-coat unit. The spin-coat unit is a high-precision device designed to evenly distribute a resist material across the substrate. The exposure unit contains a UV light source used to selectively expose patterned areas of the resist-coated wafer. It is also equipped with a rotating stage to facilitate the exposure of these patterned areas. The development unit is designed to remove exposed and unexposed portions of the resist. DNS SC-80BW-AV Photoresist Machine is a highly precise tool designed to reduce defects and increase throughput. The asset is equipped with a direct image sensing and adjustment model (DISA) to ensure highly accurate exposure of the patterned area of the substrate. The direct image sensing and adjustment equipment monitors the movement of the wafer and then adjusts the exposure of the UV light source accordingly. This system helps to reduce defects associated with uneven coating of the resist, thus increasing throughput and product quality. The unit is also equipped with an automatic resist replacement machine (ARRS) to ensure the highest degree of performance of the resist material. The ARRS continuously monitors the substrate exposure, temperature, and humidity. It then automatically adjusts the concentration and composition of the resist material to ensure the highest degree of performance. In addition, the tool is equipped with a dynamic thermal imaging asset (DTI). This model is designed to detect and measure thermal activity on the coated substrate and then adjust the temperature of the spin-coat unit accordingly. This helps to reduce the risk of defect formation caused by uneven heating or cooling of the substrate. Overall, DAINIPPON SC-80BW-AV Photoresist Equipment is a powerful automated wafer processing system that is designed to secure superior product quality with maximum throughput. Its combination of direct image sensing and adjustment, automatic resist replacement, and dynamic thermal imaging systems help to reduce defects, optimize throughput, and maximize the effectiveness of the resist material.