Used DNS / DAINIPPON SC-W60A-AV #9248933 for sale

DNS / DAINIPPON SC-W60A-AV
ID: 9248933
Wafer Size: 4"
Coater, 4".
DNS / DAINIPPON SC-W60A-AV is a state-of-the-art photoresist equipment used to fabricate integrated circuits and microelectronics. The system is based on a direct write electron beam lithography tool. It is able to accurately write onto photoresist-coated wafers using the sub-micron resolution available from the electron beam. The unit also includes software for design, pattern layout and control. DNS SCW-60A-AV's electron beam allows for both continuous writing and batch mode operations. In continuous writing, the electron beam is used to directly expose the photoresist at a constant velocity to create a continuous web pattern. In batch mode, a set of unique patterns can be created, with the electron beam deflection generating the pattern on the wafer. The machine is equipped with an integrated optics tool that consists of an objective lens, an electron source and a dedicated electro-optical circuit. This optics asset is used to focus the electron beam, enabling a range of different resolutions to be used. The optics model automatically adjusts the electron beam to maintain a constant focus over the exposed area. DAINIPPON SCW 60A AV is able to write patterns with a minimum line width of less than 0.8 microns and a minimum feature size of 0.4 microns. In addition, the electron beam can be accurately programmed to produce line patterns with a specified pitch. This capability ensures that the photoresist is exposed to precise levels of electromagnetic energy, resulting in patterns with high fidelity. DNS SC-W60A-AV also includes a control equipment designed to optimize performance when used in production. Its software includes features like pattern size verification and auto-leveling. This ensures that accurate, repeatable patterns are produced. The system also includes a number of safety features. Its gas enclosures are equipped with pressure transducers, solenoid valves and emergency pressure safety valves, ensuring that potential hazards associated with the use of electron beam lithography are kept to a minimum. Overall, SC-W60A-AV is a powerful, reliable and safe photoresist unit for creating complex integrated circuit and microelectronics designs. Its direct write electron beam lithography capabilities, integrated optics machine and control features ensure that precise, accurate, repeatable and safe patterns can be produced with maximum efficiency.
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