Used DNS / DAINIPPON SC-W60A-AV #9251325 for sale

DNS / DAINIPPON SC-W60A-AV
ID: 9251325
Wafer Size: 6"
Vintage: 1993
Coater / Developer systems, 6" 1993 vintage.
DNS / DAINIPPON SC-W60A-AV Photoresist Equipment is an advanced lithography system used to pattern microelectronic devices with high accuracy and speed. Its capabilities include advanced thin film and metrology technologies, comprehensive material handling systems, high-precision optical systems, and photoresist processing. This unit is ideal for manufacturing ultra-fine lines and ferrules in MEMS (Microelectromechanical systems) and IC (Integrated Circuits) production, as well as other processes. The machine is equipped with a dual-wavelength resonance excitation laser, polarization-maintaining fiber bellows and a whole-field projection lens. This allows for precise, repeatable exposure even for very complex patterns. The tool is also equipped with a multi-axis stage, which allows for precise and repeatable motion for a wide range of micro optical imaging applications. The stage also includes a built-in indexing feature to ensure accurate and repeatable positioning over a large range of patterns. In order to ensure a consistent resist profile, the asset is integrated with a semi-automatic wafer-handling model with vacuum evacuation chambers. During the wafer exposure step, the equipment manipulates the wafer in order to obtain an optimal resist profile, which contributes to higher yields in production. The system can also be used to pattern magnetic domains, which have a wide range of applications including MEMS, IC, hard disk drive, and flat panel display production. For this purpose, the unit is integrated with an optical dispersion polarimeter, which measures the magnetic field strength in two dimensions simultaneously. It also provides temperature stability control by actively compensating for the thermal drift associated with the imaging process. In addition, the machine is also capable of simultaneous imaging and metrology operations, which allows the user to contrast the quality of the manufactured device with the design model. This helps to improve the accuracy and reliability of the resulting product. Overall, DNS SCW-60A-AV Photoresist Tool is an advanced lithography asset with a wide range of capabilities. Its capabilities include advanced thin film and metrology technologies, comprehensive material handling systems, high-precision optical systems, and photoresist processing. Its ability to pattern magnetic domains and its high accuracy and speed make it an ideal choice for manufacturing ultra-fine lines and ferrules in MEMS and IC production.
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