Used DNS / DAINIPPON SC-W60A-AV #9251326 for sale

DNS / DAINIPPON SC-W60A-AV Photoresist Equipment is a highly versatile and compact system produced by DNS Screen Corporation. It is designed to provide the highest level of precision and accuracy when working with photoresists and related materials, making it an essential tool for a variety of photolithographic processes. DNS SCW-60A-AV is equipped with a variety of features to ensure maximum efficiency. It features a one-step mask exposure device to allow for rapid pattern exposure without the need for repeat operations. It also includes an adjustable photomask alignment unit for easy alignment of multiple masks for the same job and a micro-processing unit with a dedicated image processor to store specific settings, allowing for easy retrieval for multiple jobs and a library of job preset data. To ensure precision results, DAINIPPON SCW 60A AV has a patented airflow machine and is equipped with a high-grade, durable motor to provide a constant and stable air flow and a faster drying time for improved efficiency. It also features a dual beam tool utilizing two laser heads to ensure accuracy with job registration and a backside pre-lighting asset to maximize the optimal patterning of the resist. For maximum performance, a vacuum model is integrated in the vacuum chamber, and its external exhaust port ensures low-noise and fume-free operations. Additionally, for added safety and convenience, the design includes an emergency stop button and a keyed interlock switch to help avoid accidental operation. Furthermore, SC-W60A-AV is designed with sophisticated user interfaces to be extremely easy to operate. It offers an intuitive touch panel for easy operation even to first-time users. It also includes a digital display for the real-time monitoring of the job status. In conclusion, the innovative DNS / DAINIPPON SCW 60A AV Photoresist Equipment is a highly versatile and compact system designed to give users maximum precision and accuracy time and again under varying production conditions. With a range of sophisticated features and user-friendly interfaces, it is an essential tool for professionals who require the highest quality results in their photolithography processes.