Used DNS / DAINIPPON SC-W60A-AVG #293748583 for sale

DNS / DAINIPPON SC-W60A-AVG is a photoresist processing equipment designed for the lithographic fabrication of integrated circuits, LTCCs and MEMS. The system features an automated resist processing platform with a wide variety of processes available. The resist feature on the unit includes spray image particle application, multi-phase immersion, and spin wash. In addition, the platform enables special processes for improved resist adhesion, including aerosol and/or wetting processes after development. The platform also offers polyimide baking, baking and temperature control, oscillating brushing and other applications. Thanks to the Angstrom Robot controller, DNS SC-W60A-AVG machine is capable of performing automated wet processing in an efficient manner. It incorporates an orbital loading tool, reducing lead times and operation errors. In addition, the asset is equipped with special squeegee blades for low-drain etch gasses, ensuring a homogenous resist consistency across the entire substrate. The model comprises a linear conveying mechanism, which is driven by a reliable motor mechanism. This conveying mechanism ensures that users get consistent throughput and faster process integration. It also features a user-friendly touch screen control panel, which allows users to switch between different processing functions. DAINIPPON SC-W60A-AVG equipment is capable of controlling resist thickness, even at very low levels, and maintaining high line width accuracy. It also has PI channels to enable advanced PI separation and line feeding characteristics. Furthermore, the high-precision spray imaging jetting system allows for precise particle patterning, ensuring accurate resist definition. The unit also has superior transferring capability and can detect and compensate for wars and misalignments between the layers. This ensures that the resist is accurately transferred onto the substrate. Moreover, the consistency of the resist on the substrate surface and uniform process coverage is ensured by the pre-dipping, post-dipping, and spin-drying processes. The advanced curable resist formulations allow for high resolution and uniform resist definition, which is critical for high yield production. The machine offers efficient substrate transfer, incorporating a wide range of substrate configurations. The substrate tray sizes are 300mm x 180mm and 400mm x 400mm, enabling users to select the correct tray size for their application. SC-W60A-AVG photoresist tool is a robust and reliable solution for fast, efficient and high-yield lithographic fabrication. It offers a wide range of features and processes, making it an ideal choice for users looking for reliable and accurate photoresist processing solutions.