Used DNS / DAINIPPON SC-W60A-AVQ #9235500 for sale

DNS / DAINIPPON SC-W60A-AVQ is a photoresist equipment that is used to produce high-precision masks for a variety of semiconductor devices. The system is equipped with two photoresist exposure heads that use interference exposure technology to achieve uniform, high-precision photoresist patterns on a variety of substrates. The basic operation of the unit involves the using of a photomask, which contains the pattern to be transferred onto the substrate. The photomask is placed on the two photoresist exposure heads. Each head consists of four arc lamps and four condenser lenses in a common stage. A three-dimensional optical scanner is used to ensure uniform exposure of the photomask. The mask is exposed to light at precise angles to ensure accuracy of the image being transferred. The mask is placed on a 'sample stage' that is mounted on a high precision motorized stage, which moves in x, y, and z directions to align the photomask to the substrate. The laser alignment unit and auto alignment machine, equipped with air bearings, further guarantee precise alignment so that the photomask can be registered accurately. The tool is designed for high precision and flexibility. This is achieved through its user-friendly interface, which allows users to quickly set up and operate the asset. For example, the user can modify the light intensity of each arc lamp and the exposure time of each head. The exposure heads can be automated, allowing users to adjust the exposure time for each wavelength of light to compensate for variations in the photomask to accurately register each pattern. The model also comes equipped with image processing software, which allows users to adjust the contrast and brightness of the photomask, as well as to remove any dust particles that may be present on the photomask or substrate. This ensures high precision pattern transfer. Finally, DNS SC-W60A-AVQ contains a pair of sophisticated ion beam sputtering and vapor deposition systems. This allows for deposition of thin film materials over the patterns on the substrate. These materials, when combined with the photoresist pattern, form high reliability and highly efficient semiconductor devices. In conclusion, DAINIPPON SC-W60A-AVQ is an advanced photoresist equipment designed for producing high-precision masks for a variety of semiconductor devices. It is equipped with two precision exposure heads, laser alignment units, and image processing software which provide the user the flexibility and accuracy needed to produce high-quality masks. Additionally, its advanced sputtering and vapor deposition systems allow the user to accurately deposit thin films over the patterns on the substrate, making the most out of the photoresist system.