Used DNS / DAINIPPON SC-W60A #9142689 for sale

DNS / DAINIPPON SC-W60A is a liquid photoresist equipment consisting of photoresist, developer and aqueous remover. It is used in the semiconductor industry, primarily for patterning various components in the manufacturing of integrated circuits (IC). The photoresist system utilizes a potassium hydroxide (KOH) etch solution to etch the exposed areas of photoresist material. This etch process forms the desired pattern on the substrate and is then followed by wet cleaning and drying of the substrate. The unit has two main components, the photoresist solution and the developer. The photoresist solution is a mixture of light sensitive compounds and binders which react to UV or electron beam radiation. It provides an exceptional level of pattern fidelity, line width control and resolution. The developer is used to dissipate the exposed photoresist after the patterning process. This chemical solution is typically composed of organic solvents and organic acids such as sulfuric acid and hydrofluoric acid. In the process of patterning the photoresist, the substrate is submerged in the photoresist solution, typically for 8-15 seconds. The substrate is then exposed to UV light, electron beam or laser light for a certain period of time to cure the photoresist. The exposed areas of the photoresist are dissolved away in the developer, leaving the desired pattern on the substrate surface. The substrate is then rinsed in aqueous remover to remove any residual photoresist. The substrate is subsequently dried and ready for the next processing step. DNS SC-W60A photoresist machine is designed for high performance and precision. It offers a high-resolution pattern fidelity with superb line width control and an outstanding wet chemical resistance. The photoresist tool can be used in a variety of applications, such as IC photoresists, single and multi-layer patterning, ultra-fine patterning and high temperature reflow soldering. With its remarkable resistance to a variety of process conditions, the photoresist asset is ideal for advanced packaging and optoelectronics. Overall, DAINIPPON SCW-60A photoresist model provides a simple and reliable means of patterning micro-electronic devices. The equipment incorporates a range of advantages, including excellent adhesion to the substrate material, superior resolution and excellent line width control. The system remains a popular choice among IC manufacturers due to its proven track record of successful implementations and efficient operations.