Used DNS / DAINIPPON SC-W80A-AG #9274812 for sale

DNS / DAINIPPON SC-W80A-AG is a state-of-the-art photoresist exposure equipment that provides both high-resolution and high-precision processing. Photoresist exposure is a key step in the manufacture of semiconductor devices and required a high degree of precision and accuracy to ensure product quality. DNS SCW-80A-AG system is designed to meet these requirements. The unit is equipped with an advanced dual-beam exposure head that can accommodate two exposure beams with a maximum total energy of 1.2 kW. This provides extremely high resolution to ensure consistent, accurate pattern formation on the photoresist film. The exposure head can be tilted to obtain the optimal exposure angle and its positioning can be adjusted with the X- and Y-axes to ensure the exposure is precisely in the desired area. The machine can also be freely programmed to fine-tune the exposure parameters for greater accuracy. Furthermore, DAINIPPON SC W80A AG tool includes a scanner and exposure table that can be controlled by a programmable control asset. This allows for a wide range of exposure patterns to be executed with ease and speed. The table can be moved and rotated in order to precisely position the device or substrate for optimal exposure. DNS / DAINIPPON SCW-80A-AG model is capable of producing a minimum line width of 0.2 microns. Furthermore, the equipment has built-in mechanical and electrical safety features that prevent any unexpected exposure. Additionally, a wafer cleaning and pre-treatment system can be integrated into the unit for automated processing. Overall, DNS SC-W80A-AG is an advanced, state-of-the-art photoresist exposure machine. It is equipped with dual exposure beams and a scanner and table capable of precisely positioning substrates. Furthermore, it offers high-resolution, high-precision processing with a minimum line width of 0.2 microns. The tool also offers a variety of safety and automation features, making it an ideal choice for those who demand only the best for their substrates.