Used DNS / DAINIPPON SC-W80A-AVG #9157627 for sale

DNS / DAINIPPON SC-W80A-AVG photoresist equipment is a tool used in advanced lithography processes. The system provides precision and repeatability by utilizing a state-of-the-art light source and photomask technologies. At its core, the unit incorporates a light source: a Krypton Fluoride (KrF) excimer laser. This powerful laser provides a deep ultraviolet (UV) source of light emission, enabling a small feature size to be printed with high speed and resolution. DNS SC-W80A-AVG machine can leverage the laser's power to produce feature sizes of less than 10 nanometers (nm). The tool also has a well-designed optical light path, which provides operations with precise pattern generation and optical alignment. The optics feature a floating moveable masking platform along with a Fixed Light Shelves that supports the Mask and Laser focus. This allows for the precise alignment of the mask and laser, ensuring pattern re-alignment of +/- 1 µm. In addition to its superior optics, DAINIPPON SC-W80A-AVG asset also features an advanced photomask technology. This technology works to dispense the photoresist over the mask and substrate systems to keep them isolated from one another. The use of an advanced photomask ensures that the mask and substrate do not experience photoresist crosstalk or contamination which can lead to poor performance. In total, SC-W80A-AVG Photoresist Model is an advanced lithography tool offering superior optics and photomask technology. Its powerful KrF excimer laser enables precision feature printing with extremely small feature sizes, while the sophisticated optical light path ensures precise pattern generation and alignment. Additionally, the advanced photomask technology prevents contamination, allowing users to achieve excellent performance and repeatability.