Used DNS / DAINIPPON / SCREEN RF3 #293609035 for sale
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ID: 293609035
Wafer Size: 12"
Vintage: 2007
Coater, 12"
SC Cabinet
Waste fluid cabinet
Power supply box
ACU
ETU
Fan
2007 vintage.
DNS / DAINIPPON / SCREEN RF3 is a photoresist equipment designed for microelectronic device fabrication. The system is composed of an automated DNS printing machine and an exposure unit with a light source. This combination allows high precision, high exposure control and high exposure efficiency in the production process of microelectronics. DNS RF3 machine is equipped with a firing gun and a high-resolution optical tool. The LCD SCREEN printing machine on the exposure asset is designed to accurately expose photosensitive materials onto the substrate. The LCD DAINIPPON printing machine uses an X-Y transport model to ensure precise alignment and registration of the exposure material on the substrate. SCREEN RF3 light source for exposure can reach a light intensity of up to 8,000 mW/cm2. This light source can be adjusted for optimal exposure of the chosen photosensitive materials, as well as for exposure of the substrate. The light source is also capable of exposure in the ultraviolet range, helping to minimize any burning of the substrate due to the exposure. The exposure equipment is also configured for batch-mode operation, allowing the production of multiple substrates at once. This can reduce production times and material costs significantly. The system's automation features also reduce human error in the exposure process, resulting in higher yields. DAINIPPON RF3 unit also offers a number of other features to optimize the exposure process. It offers integrated exposure logging and recording, as well as onDNS / DAINIPPON / SCREEN set-up and control functions, providing users with complete control over their exposure process. It also offers software to correct exposure errors, minimize exposure times, and optimize product yields. In conclusion, RF3 is an efficient and accurate photoresist machine designed for microelectronic device fabrication. This tool offers high exposure control and high exposure efficiency, as well as batch-mode operation and a number of other features to optimize the exposure process. With its integrated features and control functions, the asset enables users to have full control and accuracy over the exposure process, resulting in higher yields.
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