Used DNS / DAINIPPON / SCREEN SK-W80A #293642824 for sale

DNS / DAINIPPON / SCREEN SK-W80A is a high-precision, high-speed photoresist equipment designed for the microelectronics industry. It uses Digital Neuro Image Processor (DNIP) technology to provide advanced photoresist processing capabilities. DNS SK-W80A is a fully automated photoresist system that operates at resolutions of up to 25um with a cycle time of 250ms/mm. It features a Dual Soft Fine Plus Post-exposure control unit that can match the process settings to the desired photoresist thickness. The machine also includes an image-processing controller, DNS processor, and 4-point laser alignment tool. The asset uses advanced lithography software to provide the highest level of accuracy and speed for photoresist processing. This includes simple to complex layer transfer with exact placement and time control. Additionally, the advanced multilayer settings enable the optimal deposition of each layer with extreme accuracy. The digital neuro image processor (DNIP) technology also allows digital corrections of irregularities in the incore. It enables high-precision digital correction of line widths and dielectric patterning by adjusting the digital thickness values according to a device design. The high-precision secondary exposure control can also correct irregularities in a photoresist film. This SCREEN photoresist model is ideal for advanced R&D, flexible and ultra-high density substrate levels. It can also be used in high throughput production applications as well as for prototyping and low-volume production. SCREEN SK-W80A photoresist equipment is also highly reliable and requires minimal maintenance. It is highly efficient and can be used for multiple projects and long-term orders. It is also very easy to operate and setup, with a intuitive graphical user interface (GUI). Overall, DAINIPPON SK-W80A is an advanced, fully-automated photoresist system that has the capability to achieve high-precision and speed during processing. It features DNIP technology, advanced lithography software, and a robust dual soft fine plus post-exposure control unit to ensure the highest accuracy and speed in photoresist processing. It is ideal for advanced R&D, prototyping and production applications.