Used DNS / DAINIPPON SCW-629 #9269454 for sale

DNS / DAINIPPON SCW-629
Manufacturer
DNS / DAINIPPON
Model
SCW-629
ID: 9269454
Wafer Size: 6"
Coater systems, 6".
DNS / DAINIPPON SCW-629 Photoresist equipment is a state-of-the-art photolithography system known for its highly accurate and precise patterning capabilities ideal for the production of electronics and semiconductor components. It is a single-step, high-resolution patterning unit designed to help fabricators quickly and precisely create patterns to fit tight design specifications. The machine is composed of three main parts: a light source, a photoresist material, and a preferred imaging device. DNS SCW-629 utilizes a high-intensity mercury vapor lamp rated at 150 mW/cm2 intensity as its light source. This light source provides a continuous wave providing accurate and precise results for high speed imaging. The photoresist material works with the light source to create an accurate and precise pattern. Each type of photoresist material varies in how it responds to light, so fabricators may have to experiment with multiple photoresist materials to find their ideal solution. In order to efficiently imprint the pattern onto the photoresist material, DAINIPPON SCW-629 utilizes a digital mask aligner to place the photomask over the photoresist material accurately and precisely. This allows fabricators to quickly produce patterns and results with minimal effort. Once the desired pattern has been etched onto the photoresist material, SCW-629 can be used to rapidly dry and cure the pattern. This is done by utilizing an ultra-fast set of infrared heaters to ensure the photomask and pattern are firmly attached and will not move during processing. Overall, DNS / DAINIPPON SCW-629 Photoresist tool is an efficient and powerful tool for fabricators that require highly detailed, accurate, and precise patterning capabilities. Its high quality mercury vapor lamp and digital mask aligner allow fabricators to quickly and accurately produce their desired pattern. This is further enhanced by its ultra-fast drying and curing capabilities, allowing fabricators to quickly produce their desired pattern on a wide range of photoresist materials.
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