Used DNS / DAINIPPON SCW-636-BV #9068904 for sale

DNS / DAINIPPON SCW-636-BV
ID: 9068904
Wafer Size: 5" to 6"
Developers, 5"-6".
DNS / DAINIPPON SCW-636-BV photoresist equipment is designed for advanced multilayer technologies in semiconductor manufacturing. It provides superior spin-coating process capabilities for advanced applications like plated through-holes (PTHs) and via-in-pad (VIP) technology. The system provides even layer thickness throughout the photoresist layer, resulting in enhanced product formation. Additionally, the unit reduces the risk of contamination that leads to better yields and lower costs. The machine works by first applying a photoresist to a substrate. The photoresist is then exposed to ultraviolet light, which causes parts of the photoresist to be hard and parts to be soft. The substrate is then spun at a set rotational speed, which causes the photoresist to curve, increasing the soft areas and thinning the hard areas. The tool is equipped with three axes, the advanced rotational speed controllers, and a built-in optoelectronic timer, which auto-adjusts the spin speed and timing according to user specifications. Once the process is completed, the substrate can then be processed further. DNS SCW-636-BV offers a range of advantages, such as: better coating and processing quality, controlled and uniform coating thickness, improved edge profiles, fewer defects, improved process stability and better yields. The asset is built with accuracy and precision in mind, and is capable of handling the most challenging multilayer photolithography processes. Furthermore, the model offers process monitoring and control capabilities that allow for greater process optimization and precision. The equipment has been designed for use in the industrial markets, due to its rugged construction and meticulous operating system. It is easy to set up and use and offers reliable performance for even the most challenging applications. Furthermore, its low cost, long life and less downtime ensures higher productivity and lower operational costs for users. The availability of advanced spin coating technologies allows users to leverage their use in research and development leading to the successful production of advanced new products. Overall, DAINIPPON SCW-636-BV is an advanced photoresist unit, specifically designed for use in multilayer technologies in semiconductor manufacturing. It offers a range of advantages including improved coating quality, accuracy, precision, reliability, and cost-effectiveness. With its easy setup, high performance, and low cost, it is a great choice for advanced semiconductor application processes.
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