Used DNS / DAINIPPON SCW-80A-AVP #293617284 for sale

DNS / DAINIPPON SCW-80A-AVP photoresist equipment is a highly advanced, precision etching and coating system that provides excellent accuracy for photolithographic processes. It is well suited for microfabrication processes in a wide range of industries. This unit is designed to produce exceptional, high quality photomasks that can be used in the production of functional components in various applications. DNS SCW-80A-AVP machine utilizes both an advanced electron beam evaporation (EBE) and deep ultraviolet exposure tool to deliver precise photoresist coating and exposure results. The EBE asset is used to apply thin layers of photoresist to the substrate, creating a thin film on the substrate's surface. The substrate is then placed into the model's deep ultraviolet exposure unit, where a laser beam is used to pattern the desired features onto the photoresist layer. This unit also provides exposure times that are much shorter than traditional exposure methods, allowing for rapid production times. DAINIPPON SC-W80A-AVP equipment also utilizes a vertical exposure source, which minimizes drift of exposure, ensuring that the substrate remains level throughout the exposure process. This vertical exposure source also ensures uniform coverage of the substrate's surface. The system also features an auto focus unit that is designed to ensure that the exposure beam is always directed accurately to the substrate, ensuring quality exposure results. Finally, SC-W80A-AVP machine is equipped with an automatic etching tool. This asset uses a highly precise etching process to ensure that the photomask pattern is accurately transferred onto the substrate. This highly advanced etching process provides excellent accuracy and smooth surfaces, allowing for the production of components that are highly precise and reliable. Overall, DNS SC-W80A-AVP photoresist model is an excellent choice for production-level photolithography processes. It utilizes advanced etching and exposure sources to produce photomasks of exceptional accuracy, ensuring that functional components can be produced with reliable performance. This equipment is well suited for the production of components in a wide range of industries, and is sure to provide excellent results.