Used DNS / DAINIPPON SD-200W-AVPE #9157629 for sale

DNS / DAINIPPON SD-200W-AVPE
ID: 9157629
Wafer Size: 8"
Vintage: 2001
Coater / Developer system, 8" 2001 vintage.
DNS / DAINIPPON SD-200W-AVPE photoresist equipment is a powerful and versatile development system providing advanced technology and the highest performance for various photoresist applications. It utilizes resist coatings, exposure and develop processes with high accuracy and repeatability. This unit is ideal for semi-conductor and HDI/micro-electronic device fabrication. This photoresist machine consists of a multiple-lobe rotary slit nozzle deposition head, allowing for superior uniformity in application of the resist, a cooled dual-beam motorized X-Y stage, and an automated process sequence unit. The multiple-lobe rotary slit nozzle deposition head delivers accurate and repeatable resist coating performance, and has the capacity for easy adjustment for fine-tuning the process. It is equipped with three independently controlled resist nozzles that are capable of supplying resist at different concentration levels, enabling the tool to perform resist patterning with higher accuracy. The cooled dual-beam motorized X-Y stage is designed to provide smooth, vibration-free positioning of the wafer sample during resist processing, and includes a large, split-column platform for easy mounting of multiple wafer carriers. The motorized stage allows for precise sample movements to ensure accurate and consistent resist patterns throughout the entire run. The automated process sequence unit is responsible for controlling the entire process, from scaling the size of an image to recording test of the wafer samples. It also stores the data from each sample run and allows for automated comparison of the results. With this device, engineers can optimize the asset performance over time and improve production yields. Overall, DNS SD-200W-AVPE photoresist model provides advanced technology and high performance for various photoresist applications, delivering accurate, repeatable, and reliable resist processing. From its multiple-lobe rotary slit nozzle deposition head to its automated process sequence unit, the equipment offers a comprehensive set of features, making it an ideal choice for semi-conductor and HDI/micro-electronic device fabrication.
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