Used DNS / DAINIPPON SD-80BW-AVP #9235495 for sale

DNS / DAINIPPON SD-80BW-AVP is an advanced photoresist equipment designed for a wide range of photolithography processes and capabilities. It is a highly sophisticated system, using the most advanced technologies available. It is designed to meet the needs of high-speed semiconductor manufacturing and has many advantages over traditional photoresist systems. DNS SD-80BW-AVP is equipped with a 3-axis alignment by high precision encoders, and an ozone generator to minimise the undesired reactions of photoresist to light. The unit is also designed for direct integration from single wafer, automated modules into high-end electronic manufacturing lines. DAINIPPON SD-80BW-AVP is ideal for masking, as it is able to provide both directional and non-directional uniform films on the wafer. Its uniform film capability allows the machine to provide exact minimal line widths and also allows the fine-tuning of individual mask size and shape. SD-80BW-AVP features improved sensitivity of 5 mJ/cm2 to 10 mJ/cm2 in its contact mode. This enables the exposure of previously unexposed areas such as the backside of the wafer or of embossed areas. The tool boasts very fast pattern exposure times, and is able to process wafers with resolutions up to 10 um. Its pinhole free feature and aluminum inhibitor enable it to create images with minimal degradation and wide exposure latitude, resulting in high yield rate for the products that are produced. The asset also has an anti-reflection layer which ensures improved imaging of the resist layer with less disturbance from the underlying metal layer and improves overall yield rates of the products produced. It is also able to work with various types of photoresists, allowing it to be easily tailored to a particular process. DNS / DAINIPPON SD-80BW-AVP is a reliable, robust and reliable model, built with easy to handle and use components. Its safety features, such as the ozone generator, ensure long term safety of operators and provide the necessary protection against toxic gases. In summary, DNS SD-80BW-AVP is a highly sophisticated equipment designed for high-speed semiconductor manufacturing. It features a 3-axis alignment system with high precision encoders, an ozone generator, and is able to provide both directional and non-directional uniform films on substrates. Its improved sensitivity, fast pattern exposure times, pinhole free feature, aluminum inhibitor, anti-reflection layer, and ability to work with a wide range of photoresists are all advantages of this unit. Its long term safety features, such as its ozone generator, ensure maximum protection of operators. This machine is a reliable and robust choice for any photolithography process.