Used DNS / DAINIPPON SD-W60A-AVPE #9275258 for sale

DNS / DAINIPPON SD-W60A-AVPE
ID: 9275258
Wafer Size: 6"
System, 6".
DNS / DAINIPPON SD-W60A-AVPE is a state-of-the-art photoresist equipment designed to meet the demands of modern semiconductor processing requirements. The system is capable of high-precision alignment and exposure of thin film layers on the surface of wafers, allowing for the fabrication of complex integrated circuits and IC components, and enabling advanced multi-layer packaging. DNS SD-W60A-AVPE features a high-resolution, four-pockethead alignment unit, which is capable of achieving sub-micron continuous alignment accuracy across large workpieces. The four-pockethead machine also enables accurate exposure of both top-down and side-on patterns. The tool incorporates an opto-mechanism that ensures a high-level of accuracy and repeatability, even when processing complex patterns. DAINIPPON SD-W60A-AVPE utilizes what is known as a full-field-of-view alignment camera, which offers superior performance over other alignment systems. This camera enables the asset to perfectly align patterned layers on a wafer, even when the layers differ in size or material. Additionally, the model also features an environmentally friendly and efficient water cooling equipment, which ensures the IC wafer remains in a stable temperature range during the entire expose process. SD-W60A-AVPE's main feature is its highly accurate automated photoresist system (APRS). The APRS contains two integrated parts - a programmable exposure tool and an innovative deposition tool. The programmable exposure tool allows users to quickly and accurately create intricate patterns on the wafer's surface, eliminating the need for manual alignment or positioning. The deposition tool ensures a uniform deposition of a single layer of photoresist on the wafer's surface, enabling applications such as selective coating of features and thin film layers. Furthermore, DNS / DAINIPPON SD-W60A-AVPE supports a variety of photoresist materials, including non-epoxy materials, which provides users with the flexibility to select the most suitable material for their specific application. The unit also features an integrated cleaning machine that removes residual material between exposures, and also facilitates accurate control of the thickness of the deposited photoresist layer. This control is especially important when accurate process control and repeatability are required. Overall, DNS SD-W60A-AVPE is an innovative photoresist tool that enables high-precision alignment and exposure of thin film layers on the surface of wafers. The asset's excellent accuracy and repeatability makes it suitable for both chip and package design and fabrication. Its automated photoresist model, full-field-of-view alignment camera, and cooling equipment guarantee an impressive level of accuracy with every cycle. Consequently, DAINIPPON SD-W60A-AVPE is an excellent choice for those who require high-precision photoresist processing in their semiconductor manufacturing applications.
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