Used DNS / DAINIPPON SD-W60A #9068908 for sale

DNS / DAINIPPON SD-W60A is a high precision, high performance photoresist equipment for optimizing lithography processes. The system uses a unique and innovative automatic layer remapping technology, coupled with a cutting-edge automated wafer alignment unit. This allows the machine to adapt to the most complex photolithography structures while maintaining extremely high process accuracy. The tool itself consists of a series of components, including a master CDM-4000A exposure control unit, a DVT-4050 lens unit, an LWV-6050 lens alignment unit, a XSM-6050 linear stepper motor, and a DLT-6500 exposure control unit. The asset also utilizes an advanced pre-exposure imaging model composed of high-resolution cameras, and a CCD. Each component plays a key role in the integrated photoresist equipment. The master CDM-4000A provides an advanced photoresist control unit with functions for patterning alignment, layer selection, and optimization. The DVT-4050 is specifically designed for controlling the exposures and stepper motor movements. It also includes auto-correction of the alignment, focusing, and exposure rate. The LWV-6050 lens alignment system provides for the optimal alignment of the exposed wafer. The XSM-6050 motor scans the wafer at a minimum pitch of 8 microns and can be adjusted to accelerate the exposure process. The DLT-6500 performs the monochrome or polychrome coating deposition. The engineering solutions delivered by DNS SD-W60A unit enable the production of a wide range of prototype and mass-produced photolithographic components. Its use is especially beneficial in the manufacture of precision flat-panel displays, microelectromechanical systems, organic light-emitting diode displays, and holographic data storage elements. The machine is also used in the production of micro-machined components such as ultra-thin drill-bits and cutting-edges. DAINIPPON SD-W60A tool also offers a number of advantages over traditional photolithography processes. Its speed and the fact that the entire asset can be controlled via a single graphical user interface provides improved workflow monitoring, while the automated layer remapping feature provides improved patterning accuracy and repeatability. Additionally, the model is compatible with several commonly used exposure materials, including UV photoresists and photopolymers. Overall, SD-W60A is a high-end photoresist equipment for users with demanding needs. It offers a combination of precision, speed and optimized processing solutions enabling mass volume production with greater efficiency. The system's advanced alignment and imaging technologies allow for improved workflow management, improved patterning accuracy and repeatability, and faster exposure times. It is suitable for use in a wide range of application and provides an excellent platform for photolithographic tasks.