Used DNS / DAINIPPON SD-W80A-A #9227393 for sale

DNS / DAINIPPON SD-W80A-A photoresist set is a high-end, state-of-the-art silver halide photoresist equipment designed for use in lithography processes. It is an advanced component developed by DNS Screen Co., Ltd. for both research and industrial purposes. The system is among the fastest of any current photoresist unit, achieving unprecedented speeds in both resist deposition and exposure time. It offers excellent decision-making and has the ability to uniformly reproduce an image across the entire substrate. It also features a low defectivity rate, yielding consistently good results. The unit is based on DAINIPPON W-series photoresist formulations and is compatible with both positive and negative film exposure. This enables it to produce a range of photoresist patterns from the smallest dimensions possible. The machine is also capable of working with a wide range of process chemistries, including chlorine- and non-chlorine-containing solutions for use on organic substrates. DNS SD-W80A-A is designed for use in single-pass high-resolution lithography processes with a wide range of film formats. It can accurately render the pattern size and width desired without jamming or freezing and with the utmost speed possible. The tool can also produce a higher resolution than other photoresist systems on the market. The asset's main components include a high-precision digital exposure head, ultraviolet light souces, an air shower model, and an automated, on-board processor. The device also offers an easy-to-use interface and advanced features such as automated image-management. DAINIPPON SDW-80A-A photoresist equipment is a perfect choice for high-end lithography applications. Its features, such as its outstanding speed, accuracy, and advanced process control, all make it an ideal choice for any professional who needs results fast and accurately. High level of uniformity in pattern reproduction is also assured by the device. Highly dependable, the system is also well-suited for the reliable production of precise and intricate photoresist patterns.