Used DNS / DAINIPPON SD-W80A-AVP #293760414 for sale

DNS / DAINIPPON SD-W80A-AVP is a photoresist equipment capable of handling high-resolution photoresist patterning tasks. It is a multi-function system that includes exposure, post-exposure bake (PEB), and application of post-exposure bakes (PEC) to create or refine patterns. DNS SDW-80A-AVP is a versatile photoresist unit that allows for exceptional control over the patterning process. It features a solid-state laser with a high repetition rate and a high beam power that enables high-resolution patterning with accuracy and repeatability. The machine also has a high-performance, low-voltage exposure monitor for precise exposure control and a programmable controller for the application of the post-exposure bake (PEC) process. It is capable of handling a wide range of photoresist materials and substrates. The available process gas mix can be adjusted to control the temperature and pressure during the exposure process, allowing the tool to handle a wide range of resist types, substrates, and feature sizes. The asset also has an integrated cooling unit that ensures efficient thermal management of the sensitive resist material during the exposure process. DAINIPPON SD W80A AVP allows for precise exposure control with a high degree of control over the dosage. This allows for the creation of small photoresist lines and other shapes with incredibly fine resolution. The exposure monitor allows for precise dose control, even at lower doses, and the integration of the PEC process enables efficient, high-yield patterning performance. The operation of this model is easy and intuitive, making it ideal for prototyping tasks as well as production runs. The built-in LCD display allows for visual feedback of the exposure process settings, including the laser and gas mix parameters, substrate size and orientation, and the exposure times for both the pre- and post-exposure processes. DNS / DAINIPPON SD W80A AVP is a robust, cost-effective photoresist equipment that ensures superior patterning performance and yield for the most demanding production requirements. Its versatile capabilities, precise control, and reliable operation make it an excellent choice for any photoresist patterning application.