Used DNS / DAINIPPON SDW-636-CV #9068905 for sale

DNS / DAINIPPON SDW-636-CV is a photoresist equipment designed for use in in advanced photolithography applications. It is a solution of high-resolution, fast-drying photoresists in a solvent. It produces high resolution and superior profile characteristics with excellent adhesion to substrates. The system has a high photospeed and low absorption which makes it ideal for less time consuming patterning. The unit comprises of a light-sensitive polymer, which when exposed to light acts to etch a pattern on the substrate. The machine has two components: a photoresist solution and a developer solution. The photoresist solution is mixed with a solvent and then applied to a substrate. The ready to use photoresist solution is applied to the substrate using either spin or spray coating. A mask is used over the substrate to protect the substrate from light exposure depending on the pattern to be etched on the substrate. After coating, the substrate is exposed to light with high intensity such as from a mercury arc lamp. The light causes the photoresist to polymerize where exposed to the light and this acts to form an etch mask. The developer solution is then applied to the substrate to remove the photoresist which had remained transparent during the exposure process and this leaves an etched pattern. The advantage of this solvent-based tool is the ability to etch complex shapes in a single step. The adhesion properties of the chemical cast Dupont DNS SDW-636-CV are superior which makes it suitable for etching small features in higly-constrained or mobile substrata. The asset is suited for various materials compatible with the photoresist and developer solutions such as glass, silicon wafers, alumina and quartz. DAINIPPON SDW-636-CV offers excellent process control which enables reproducibility in patterns across substrates with the same exposure parameters. This makes it ideal for feature-sensitive industries such as integrated circuit fabrication. In conclusion, SDW-636-CV is a reliable and versatile solution for advanced photolithography applications. It has excellent adhesion properties to substrata and offers superior resolution and profile characteristics. The model is ideal for time-sensitive applications as well as for feature-sensitive industries.