Used DNS / DAINIPPON SK-200 #9256669 for sale

DNS / DAINIPPON SK-200 photoresist equipment is a high-performance imaging system designed for use in the photomask and wafer fabrication markets. It is a two-step image transfer unit that combines a neutralized pure geometrical beam delivery machine with a vapor deposition method for the photoresist coating. The image delivery tool of DNS SK-200 uses an intense beam of UV light that is neutralized to immediately deliver the original geometrical shape of the mask pattern to the wafer without distortion. The beam delivery asset also employs intra-field and inter-field control methods to achieve uniform image quality regardless of the mask pattern size. The vapor deposition method allows for a uniform coating of photoresist on the wafer surface without over- or under-exposure. This provides a consistent photoresist coating across the entire wafer surface, even for complex pattern design. The photoresist-coated wafer is then exposed to a high intensity UV laser beam and a uniform exposure depth is achieved throughout the wafer. DAINIPPON SK-200 is capable of achieving sub-micron pattern precise resolution for the highest quality images and is suitable for all substrates including multilayers and photomasks. It has a wafer size range from 2" to 12" and is designed to be used in a variety of environments from laboratory to production settings. SK-200 is an excellent imaging model for photomask and wafer fabrication. Its combination of neutralized beam delivery with a vapor deposition method for photoresist coating ensures uniform image quality and precise resolution. It is well-suited for both laboratory and production applications and is designed with features to facilitate automation and maximize throughput.